In a weakly recovering economy it is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business. See the latest in:
+ Electron-Beam Lithography
+ EUV
+ Metrology
+ Lasers
+ Nanotechnology
+ Optical/Laser Microlithography
+ Resist Technology and Processing
+ Software
+ Electronic Imaging Components
AUDIENCE
+ Engineers and Designers
+ Corporate Managers From The Mask Making Industry
+ Application and Product Developers
+ Mask and Chip Designers
+ Resist Chemists
+ Quality Assurance Specialists
+ Experts in Mask Infrastructure and Mask Integration
+ People Working in Emerging Mask Technologies
Exhibition Dates and Hours:
Tuesday 20 September | 10:00 am to 4:30 pm; 6:30 pm to 8:00 pm
Wednesday 21 September | 10:00 am to 4:00 pm
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